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  • Sample preparation
    • Magnetron sputtering
    • Ion-beam sputtering
    • Pulsed laser deposition
    • Electron-beam lithography
  • Structural and chemical characterization
    • SEM – Scanning Electron Microscopy
    • XRR – X-ray Reflectometry
    • XRD – X-ray Diffraction
    • LEED, RHED (Low Energy Electron Diffraction, High Energy Electron Diffraction)
    • XRF – X-ray Fluorescence
    • XPS and AES spectroscopy
    • Profilometer (measurements of thin films thickness)
  • Static magnetic measurements
    • VSM – Vibrating Sample Magnetometer
    • GMR – Giant Magneto Resistance
    • P-MOKE Magnetometer
    • P-MOKE Microscopy
  • Dynamic magnetic measurements
    • VNA-FMR – Vector Network Analyzer – Ferromagnetic Resonance
    • FMR – Ferromagnetic Resonance
    • PIMM – Pulsed Inductive Microwave Magnetometer
  • High vacuum and electrochemical equipment for hydrogen absorption/desorption with optical or electrical monitoring
  • Infrastructure - presentation

AparaturaAparatura

 

The UHV laboratory is equipped with a set of chambers with a mean base pressure of 5x10-9 mbar (PREVAC). The system enables to prepare ultrathin layers and nanostructures by PVD (EBV evaporation and thermal evaporation), and further surface analysis: structural – LEED, RHEED; electronic with the use of home-made SPM; compositional- X-ray photocpectroscopy (XPS- VG Scienta).

UHV laboratory

Tło strony

Żel fizyczny utworzony przez żelator methyl-4,6-O-(p-nitrobenzylidene)-α-D-glukopyranozę z butanolem w stężeniu 2%, obraz z polaryzacyjnego mikroskopu optycznego